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Vacuum-arc plasma source with extended cylindrical cathode

机译:带有扩展圆柱阴极的真空电弧等离子体源

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The experimental study of vacuum-arc plasma source with extended cylindrical cathode is carried out. The plasma source is intended for the protective coating deposition on articles having the form of closed containers. The plasma source cathode is fabricated as a cylinder with diameter 60 mm and length 750 mm. Aluminum is used as cathode material. Inside the cathode there is the cylindrical space where the magnetic system consisting of stabilizing coil and the controlling coil is arranged. The developed plasma source was used for aluminum coating deposition on the inner surface of cylindrical container of stainless steel with diameter 100 mm and the height 600 mm at the anode potential of arc discharge. To study the obtained coatings the stainless steel specimens were disposed on the end face and on the side surface of the container. Arc discharge current in the process of coating deposition was 100 A. The deposition rate was 12.5 mkm/h. Variation of coating thickness over the length, so that the variation of coating thickness on the side and face surfaces of the container makes up ±15%. It is shown that the proposed procedure of coating deposition is characterized by the high coefficient of the cathode material utilization factor, approaching 100%. The cathode spot control in the evaporator is effectively-realized in the range of arc current 100-200 A.
机译:进行了带延伸圆柱阴极的真空电弧等离子体源的实验研究。等离子体源用于在具有密闭容器形式的制品上进行保护性涂层沉积。将等离子体源阴极制成直径为60 mm,长度为750 mm的圆柱体。铝用作阴极材料。在阴极内部有一个圆柱形空间,在该空间中布置了由稳定线圈和控制线圈组成的磁系统。所开发的等离子体源用于在直径为100 mm,高度为600 mm的不锈钢圆柱形容器的内表面上在电弧放电阳极电位下进行铝涂层沉积。为了研究获得的涂层,将不锈钢样品放置在容器的端面和侧面。涂层沉积过程中的电弧放电电流为100A。沉积速率为12.5 mkm / h。涂层厚度随长度的变化,因此容器侧面和侧面的涂层厚度变化为±15%。结果表明,所提出的涂层沉积工艺的特点是阴极材料利用率高,接近100%。在电弧电流100-200 A的范围内,可有效实现蒸发器中的阴极斑点控制。

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