High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter

摘要

The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magneticudisland” filter, which is suitable for industrial applications, are briefly described. The device is characterized byudachievable output ion current up to 4 A at an arc current of 100 A, Ti coating deposition rate at a distance ofud150 mm from the outlet is 20 micron/hour within the circle of 180 mm diameter. In terms of productivity and qualityudof plasma purification from particulates the developed plasma source is superior to world analogues by 1.5...2 times.