首页> 外文会议>Conference on Photon Processing in Microelectronics and Photonics III; 20040126-20040129; San Jose,CA; US >Excimer lasers turning flexible -variable Marking with Micro Mirror Devices
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Excimer lasers turning flexible -variable Marking with Micro Mirror Devices

机译:准分子激光转向灵活可变的微镜设备打标

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Higher and higher through-puts in marking industry are todays requirements: especially part-by-part varying markings like serial numbers, weight, date or barcodes are asked for. Taking advantage of the photosensitivity of commonly used opigments like titanium oxide marking industry is interested in turning existing excimer laser marking processes into a flexible, high-speed on-the-fly marking technique. Current laser marking techniques like direct writing using a scanned laser beam offer flexibility but have limitations with sensitive materials like paper or plastics. Excimer laser mask projection technique is best suitable for sensitive materials but up to now has the drawback of invariability due to fixed transmittive masks. The Fraunhofer IWS developed a marking system using excimer laser mask projection with a micro mirror device (MMD) as 'flexible mask'. With up to 2 million separate controllable micro mirrors the MMD provides variability: with every single laser pulse a new complex marking can be achieved. To demostrate the capabilities the FhG IWS used a 308nm excimer laser and a reflective phase-shifting mask from FhG IMS. It was possible to generate free-programmable, high-contrast markings on materials like paper and plastic. Furthermore, it could be shown that the technique is also usable to generate 3D structures in PI. Result of the studies is the development of a very fast marking technique using MMDs in combination with short wavelength and short pulse lasers. It also has high potential in 3D laser micromachining.
机译:如今,标记行业的吞吐量越来越高:特别是要求逐批更改的标记,例如序列号,重量,日期或条形码。利用诸如氧化钛标记工业之类的常用设备的光敏性,有兴趣将现有的受激准分子激光标记工艺转变为一种灵活的高速实时标记技术。当前的激光打标技术(例如使用扫描的激光束直接书写)提供了灵活性,但在诸如纸或塑料的敏感材料上却受到限制。准分子激光掩模投影技术最适用于敏感材料,但由于固定的透射掩模,迄今为止一直存在不变性的缺点。 Fraunhofer IWS开发了一种标记系统,该系统使用准分子激光掩模投影以及微镜设备(MMD)作为“柔性掩模”。 MMD拥有多达200万个单独的可控微镜,可提供可变性:每产生一个激光脉冲,就可以实现新的复杂标记。为了演示功能,FhG IWS使用了308nm的准分子激光器和FhG IMS的反射相移掩模。可以在纸和塑料等材料上生成可自由编程的高对比度标记。此外,可以证明该技术还可用于在PI中生成3D结构。研究的结果是开发了一种非常快速的标记技术,该技术将MMD与短波长和短脉冲激光结合使用。它还在3D激光微加工中具有很高的潜力。

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