首页> 外文会议>Conference on Device and Process Technologies for Microelectronics, MEMS, and Photonics; 20071205-07; Canberra(AU) >A novel fabrication method of needle array combined X-ray gray mask with LIGA process
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A novel fabrication method of needle array combined X-ray gray mask with LIGA process

机译:一种LIGA工艺结合X射线灰罩的针阵列新方法

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We have succeeded in fabricating a needle array of polycarbonate by using a three-dimensional LIGA process. The diameter of the bottom of the needle was about 50 μm, and the height was 135 μm. Although a usual LIGA process has been employed to form structure only with vertical sidewalls, it has now become possible to fabricate needle shape structure by employing a technology that combines X-ray gray mask with the LIGA process. The X-ray gray mask was composed of Si X-ray absorbers and a SU-8 membrane. The sidewall of the X-ray absorber was diagonally processed by Si tapered-trench-etching technology where the transmission intensity of X-rays could be varied locally. An X-ray lithography experiment was executed by using the X-ray gray mask on a beamline BL-4 in TERAS synchrotron radiation facility at AIST. Using this technology a PMMA resist master with three-dimensional structures was made. A Pt layer was sputter deposited as a seed layer on the PMMA resist master, and a Ni mold was fabricated by an electroforming technology. In addition, needle arrays of polycarbonate (PC) and of polymethyl methacrylate (PMMA) were produced by hot embossing technology. Thus, we succeeded in extending the LIGA process to a three-dimensional process capability by employing X-ray gray mask.
机译:我们已经通过使用三维LIGA工艺成功地制造了聚碳酸酯的针阵列。针的底部的直径为约50μm,并且高度为135μm。尽管已经采用通常的LIGA工艺来形成仅具有垂直侧壁的结构,但是现在已经可以通过采用将X射线灰色掩模与LIGA工艺相结合的技术来制造针状结构。 X射线灰罩由Si射线吸收剂和SU-8膜组成。 X射线吸收器的侧壁通过Si锥形沟槽蚀刻技术对角处理,其中X射线的透射强度可以局部改变。通过在AIST的TERAS同步加速器辐射设施中的光束线BL-4上使用X射线灰色掩模执行X射线光刻实验。使用该技术,制造了具有三维结构的PMMA抗蚀剂原版。在PMMA抗蚀剂母盘上溅射沉积Pt层作为种子层,并且通过电铸技术制造Ni模具。另外,通过热压印技术生产了聚碳酸酯(PC)和聚甲基丙烯酸甲酯(PMMA)的针阵列。因此,我们通过使用X射线灰色掩模成功地将LIGA工艺扩展到了三维工艺能力。

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