Characterization of new ultra thick chemically amplified positive tone photoresists suitable for electroplating application

摘要

There is an increasing need for highly viscous and easy to process thick and ultra thick photoresists for the production of Micro-Electro-Mechanical-Systems (MEMS) and advanced packaging. Here we present results with some novel positive tone photoresists formulated for this purpose. For that we transfered the concept of chemically amplified resists (CARs), originally designed to meet the IC-industry demands for miniaturization and higher resolution, to highly viscous resists. Various polymeric materials have been tested regarding their use in thick GARs. Appropriate resist formulations were developed and their lithographic performance was investigated in a thickness range of 50-150 microns. The CARs are sensitive to UV400.