National Lab of integrated opto-electronics, Department of Electronic Engineering, Tsinghua University, Beijing 100084, P. R. China;
Al_2O_3 doped ZnO; conductive thin film; magnetron sputtering; characterization; vacuum annealing;
机译:射频磁控溅射粉末靶制备AZO / Ag / AZO透明导电膜的制备与表征
机译:直流磁控溅射制备透明导电AZO薄膜及其真空退火
机译:直流磁控溅射高导电性ZnO(ZnAl_2O_4)陶瓷靶的透明导电ZnO:Al薄膜的制备与表征
机译:RF磁控溅射C轴取向透明导电纳米晶偶氮薄膜的制造与表征
机译:射频磁控溅射生长的GaN薄膜的特性用于制造AlGaN / GaN HEMT生物传感器
机译:射频磁控溅射制备高透射率和红外反射率的纳米柱状结晶ITO薄膜
机译:射频磁控溅射制备的透明导电红外反射AZO / Cu / AZO多层膜