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Transparent conductive and infrared reflective AZO/Cu/AZO multilayer film prepared by RF magnetron sputtering

机译:射频磁控溅射制备的透明导电红外反射AZO / Cu / AZO多层膜

摘要

AZO/Cu/AZO multilayer films were prepared on glass substrate by radio frequency magnetron sputtering technology. The prepared films were investigated by a four-point probe system, X-ray diffraction, optical transmittance spectra, scanning electron microscope, atomic force microscopy and Fourier transform infrared spectroscopy. The results showed that Cu inner layer started forming a continuous film at the thickness around 11 nm. The prepared AZO/Cu/AZO samples exhibited the visible transmittance of 60-80 % and sample with 15 nm Cu inner layer showed the highest infrared reflection rate of 67 % in FIR region and the lowest sheet resistance of 16.6 Omega/sq. The proper visible transmittance and infrared reflection property of the AZO/Cu/AZO multilayer film make it a promising candidate for future energy conservation materials.
机译:采用射频磁控溅射技术在玻璃基板上制备了AZO / Cu / AZO多层膜。通过四点探针系统,X射线衍射,光学透射光谱,扫描电子显微镜,原子力显微镜和傅里叶变换红外光谱对制备的膜进行研究。结果表明,Cu内层开始以约11nm的厚度形成连续膜。制备的AZO / Cu / AZO样品具有60-80%的可见光透射率,而具有15 nm Cu内层的样品在FIR区域具有最高的红外反射率67%,最低的薄层电阻为16.6 Omega / sq。 AZO / Cu / AZO多层膜适当的可见光透射率和红外反射特性使其成为未来节能材料的有希望的候选者。

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