首页> 外文会议>China-Russia Symposium on New Materials and Technologies; 20051102-05; Guangzhou(CN) >Fabrication of Y_2O_3 buffer layer on polished Ni substrates for YBCO superconducting tape
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Fabrication of Y_2O_3 buffer layer on polished Ni substrates for YBCO superconducting tape

机译:YBCO超导带的抛光Ni衬底上Y_2O_3缓冲层的制备

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Highly cube textured Ni tapes are produced by heavy cold rolling and recrystallization annealing. The textured nickel tapes have been proven to be suitable substrates for YBCO superconducting tape. Nevertheless, rolling damage and grain boundary grooves on Ni influence the epitaxial growth of highly textured buffer and YBCO layers. The polishing of the Ni substrate surface may play a crucial role in making it beneficial to epitaxial film deposition. In our work, several polishing methods were adopted on Ni to reduce the depth of rolling damage and grain boundary grooves. On the polished Ni substrates, textured Y_2O_3 buffer layers were deposited using RF sputtering. XRD results show that in-plane texture of Y_2O_3 films will minish with the decreasing of the Ni substrate surface roughness. AFM results show that average grain size of the Y_2O_3 film is biggest and surface is coarse in film on flatter Ni surface.
机译:通过大量的冷轧和再结晶退火生产出高立方晶格的镍带。织纹镍带已被证明是YBCO超导带的合适基材。但是,Ni上的滚动损伤和晶界槽会影响高度织构的缓冲层和YBCO层的外延生长。 Ni衬底表面的抛光在使其有益于外延膜沉积方面可能起关键作用。在我们的工作中,对镍采用了几种抛光方法以减少轧制损伤和晶界沟槽的深度。在抛光的Ni基板上,使用RF溅射沉积纹理化的Y_2O_3缓冲层。 XRD结果表明,随着Ni基体表面粗糙度的减小,Y_2O_3薄膜的面内织构将逐渐消失。原子力显微镜结果表明,在较平坦的镍表面上,Y_2O_3薄膜的平均晶粒尺寸最大,且表面较粗糙。

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