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Enhancement of photocurrent and responsivity of Zn_(1-x)Mg_xO (x=15 ) –based ultraviolet detector by UV-Ozone treatment

机译:UV-臭氧处理增强了基于Zn_(1-x)Mg_xO(x = 15%)的紫外探测器的光电流和响应度

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摘要

UV photodetector have been successfully implemented in various applications like ozone sensing,communication, astronomy and flame detection etc. Zn(Mg)O is a wide band gap material with high excitonic bindingenergy at room temperature thus making it a promising material in optoelectronic industries. In the present work, we areachieving increased photocurrent and high responsivity in UV-A regime with post growth UV-ozone treatment fromphotodetector fabricated using RF sputtered ZnMgO thin film. The thin film was deposited on semi-insulating siliconwafer at 400C for 20 min followed by 70 min UV-Ozone treatment. The final step was to fabricate an interdigitatedelectrode on the processed samples. More than two times enhancement of photocurrent was observed after UVOtreatment. Noteworthy responsivity values of 22 A/W and 67 A/W were measured from as-deposited and UVO annealedphotodetector, respectively at 380 nm with an applied bias of -5 V bias. However, the measured detectivity values for asgrown and UV-O annealed sample was 1.3 x 10~(13) and 2.7 x 10~(13), respectively. Noise equivalent power in as-depositedsample and UVO treated sample was estimated to be 2.4 ˟ 10~(-12 W/√Hz and 1.1 ˟ 10~(-12) W/√Hz respectively. Photodetector fabricated with UV-O annealing exhibited good switching behaviors with 37 ms and 30 ms rise and fall time,respectively.
机译:紫外光电检测器已成功应用于臭氧检测,通信,天文学和火焰检测等各种应用中。Zn(Mg)O是一种宽带隙材料,在室温下具有高激子结合能,因此使其成为一种光电子行业中很有希望的材料。在目前的工作中,我们正在通过使用RF溅射ZnMgO薄膜制造的光电探测器通过生长后的紫外线臭氧处理,实现UV-A方案中增加的光电流和高响应性。将该薄膜在400℃的半绝缘硅晶片上沉积20分钟,然后进行70分钟的UV-臭氧处理。最后一步是在处理后的样品上制作叉指电极。在UVO \ n处理后,观察到光电流增强了两倍以上。分别在380 nm和施加-5 Vbias的偏压下,分别从沉积状态和UVO退火\ r \ n光电探测器测量到22 A / W和67 A / W的值得注意的响应度值。然而,经退火和UV-O退火的样品的检测灵敏度分别为1.3 x 10〜(13)和2.7 x 10〜(13)。沉积样品和经UVO处理的样品的噪声等效功率分别为2.4×10〜(-12 W /√Hz和1.1×10〜(-12)W /√Hz。用UV-O退火制造的光电探测器表现出良好的开关性能,分别具有37 ms和30 ms的上升和下降时间。

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  • 来源
    《Oxide-based Materials and Devices X》|2019年|109192L.1-109192L.8|共8页
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400 076, Maharashtra, India;

    Centre for Research in Nanotechnology Science, Indian Institute of Technology Bombay, Powai, Mumbai 400 076, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400 076, Maharashtra, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400 076, Maharashtra, India;

    National Institute of Technology Durgapur, Durgapur 713209, West Bengal, India;

    National Institute of Technology Durgapur, Durgapur 713209, West Bengal, India;

    National Institute of Technology Durgapur, Durgapur 713209, West Bengal, India;

    National Institute of Technology Durgapur, Durgapur 713209, West Bengal, India;

    Department of Electrical Engineering, Indian Institute of Technology Bombay, Powai, Mumbai 400 076, Maharashtra, India subho@ee.iitb.ac.in;

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