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First Direct Synthesis of Graphene/Half-metallic Heusler Alloy Heterostructure forSpintronic Device Applications

机译:首次直接合成用于自旋电子器件的石墨烯/半金属赫斯勒合金异质结构

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The low spin signal and tiny magneto-resistance is becoming a central issue in graphene-spintronicdevices [1] in which conventional ferromagnets (FMs) such as Ni, Co, Fe of low spin polarization wereused. Adopting highly spin-polarized material such as half-metal into graphene/FM heterostructure can bethe most effective way to enhance the performance of graphene-spintronics device, experimentaldemonstration, however, is still lacking. This study, for the first time, reports a new heterostructureconsisting of a single layer graphene (SLG) synthesized by high-vacuum chemical vapor deposition (CVD)on Co2FeGe0.5Ga0.5 (CFGG) Heusler alloy whose half-metallicity has been confirmed experimentally [2].
机译:低自旋信号和微小的磁阻正成为石墨烯-自旋电子器件[1]的中心问题,在石墨烯-自旋电子器件中,使用了传统的铁磁体(FM),例如低自旋极化的Ni,Co,Fe。在石墨烯/ FM异质结构中采用高度自旋极化的材料(例如半金属)可能是提高石墨烯-自旋电子器件性能的最有效方法,但仍缺乏实验论证。这项研究首次报道了由高真空化学气相沉积(CVD)在Co2FeGe0.5Ga0.5(CFGG)Heusler合金上通过高真空化学气相沉积(CVD)合成的单层石墨烯(SLG)构成的新的异质结构,该实验已通过实验证实了其半金属性[2]。

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