Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Molecular Imprints, Inc, 1807-C West Braker Lane, Austin, TX 78758 USA;
Jet and Flash Imprint Lithography; J-FIL; throughput; defectivity; imprint lithography;
机译:用于喷射和闪光压印光刻的精密叠加的纳米级放大和形状控制系统
机译:使用喷射和闪光压印光刻技术进行掩模复制
机译:减少喷射和闪光压印光刻中高密度全场图案的缺陷
机译:适用于半导体存储应用的高通量喷射和闪存压印光刻
机译:分步和闪光压印光刻:用于制造高级集成电路的材料和应用。
机译:通过全晶圆和卷对卷分步闪光纳米压印光刻技术生产的塑料基板单层宽带抗反射涂层
机译:半导体高批量生产的步骤和闪光印记光刻
机译:在某些EpROm,EEpROm,闪存和闪存微控制器211半导体器件以及包含它的产品中。调查编号337-Ta-395