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机译:使用喷射和闪光压印光刻技术进行掩模复制
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
Molecular Imprints, Inc.1807-C West Braker Lane Austin, Texas 78758;
jet and flash imprint lithography; mask; replication; high contrast mark;
机译:使用喷射和闪光压印光刻技术进行掩模复制
机译:使用掩膜对准器的闪光压印光刻:一种在光敏水凝胶中印刷纳米结构的方法
机译:克服了用于光电应用的分步和闪光压印光刻技术复制“ motheye镜片”所面临的材料挑战
机译:使用Jet和Flash压印光刻的掩模复制
机译:具有成本效益的压印模板制造,用于分步和快速压印光刻。
机译:通过全晶圆和卷对卷分步闪光纳米压印光刻技术生产的塑料基板单层宽带抗反射涂层
机译:使用JET和Flash™印记光刻的高性能线栅极偏振器
机译:通过具有50nm线宽的X射线掩模的三电平电子束光刻制造,以及通过X射线纳米光刻复制