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Investigation of high amp;chi; block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST

机译：高奇调查定向自组装用嵌段共聚物：PS-b-PHOST的合成与表征

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Directed self assembly (DSA) of block copolymers (BCP) could enable high resolution secondary patterning via pitchmultiplication from lower resolution primary lithographic patterns. For example, DSA could enable dense feature production atpitches less tha

机译：嵌段共聚物（BCP）的直接自组装（DSA）可以通过来自较低分辨率主光刻图案的间距倍增实现高分辨率辅助图案化。例如，DSA可以使密集要素生产的场地更少

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《Alternative lithographic technologies IV.》|2012年|P.10.1-10.9|共9页
会议地点 San Jose CA(US)
作者
Nathan D. Jarnagin; Jing Cheng; Andrew Peters; Wei-Ming Yeh; Richard A. Lawson; Laren M. Tolbert; Clifford L. Henderson;
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Georgia Institute of Technology (United States);

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会议组织
原文格式 PDF
正文语种 eng
中图分类微电子学、集成电路（IC）;微电子学、集成电路（IC）;
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Investigation of high amp;chi; block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST

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