TOSHIBA Corporation Corporate Research and Development Center,Device Process Development Center, Advanced Lithography Process Technology Dept.8 Shinsugita-cho, Isogo-ku, Yokohama City, Japan 235-8522;
TOSHIBA Corporation Corporate Research and Development Center,Device Process Development Center, Advanced Lithography Process Technology Dept.8 Shinsugita-cho, Isogo-ku, Yokohama City, Japan 235-8522;
TOSHIBA Corporation Corporate Research and Development Center,Device Process Development Center, Advanced Lithography Process Technology Dept.8 Shinsugita-cho, Isogo-ku, Yokohama City, Japan 235-8522;
nanoimprint; lithography; template; defect control; overlay accuracy; CD uniformity; lithography investment;
机译:纳米压印光刻技术和半导体器件的未来构图
机译:使用热纳米压印光刻技术对铟锡氧化物进行直接图案化,以用于高效光电器件
机译:用于半导体和图案化介质制造的纳米压印光刻技术的技术评估和评估
机译:半导体器件和FuturePatterning Innovation的NanoImprint光刻
机译:纳米压印光刻和发光器件应用的大面积纳米仪的研究进展
机译:纳米压印光刻步进机用于批量生产前沿半导体集成电路
机译:通过纳米压印光刻批量制造纳米图案化的石墨烯器件
机译:纳米级磁电子器件平行构图的纳米压印光刻技术