首页> 外文会议>Advances in Resist Technology and Processing XXI pt.1 >Effect of Background Exposure Dose upon Line Edge Roughness (LER)
【24h】

Effect of Background Exposure Dose upon Line Edge Roughness (LER)

机译:背景暴露剂量对线条边缘粗糙度(LER)的影响

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

LER is found to correlate strongest with the background, or flare, portion of the lithographic aerial image contrast, when compared with the image slope and "standard" (max - min)/(max + min) contrast. A large pool of collected data and rigorous statistical analysis of variance conclude with far greater than 99% confidence that as any of these measures of aerial image profile degrade, LER increases. However, the relation between background exposure and LER is by far the most significant.
机译:当与图像斜率和“标准”(最大-最小)/(最大+最小)对比度相比时,发现LER与光刻航空图像对比度的背景或耀斑部分之间的相关性最强。大量收集的数据和严格的方差统计分析得出的结论远远超过99%的置信度,即随着这些航空影像轮廓度量的降低,LER会增加。然而,迄今为止,背景暴露与LER之间的关系最为重要。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号