The synthesis and properties of N-hydroxy Maleopimarimide Sulfonate derivatives as PAG and inhibitor for Deep UV photoresist

摘要

A few kinds of N-hydroxy maleopimarimide sulfonate derivatives were synthesized. These compounds have high solubility in commonly used solvents and high thermal stability. The UV absorption properties of these compounds in polyethylene glycol film indicate that they have suitable absorption and transparency at 193 nm wavelength. The photolysis and lithography of these compounds under radiation of low pressure Hg lamp were studied.