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Dynamics of As Atoms in the Reconstruction Layer of the As-rich GaAs(001) c(4x4) Surface

机译:富砷GaAs(001)c(4x4)表面重建层中As原子的动力学

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The dynamics of As atoms in the reconstruction layer of the As-rich GaAs(001) c(4x4) surface is studied by molecular dynamics calculations with the semi-empirical PM3 formalism. The surface As atoms have, as expected, increased vibrational amplitudes compared to the bulk. In addition, large anisotropies exist between vibrational amplitudes normal vs. parallel to the surface and also between the [-1,1,0] vs. [1,1,0] surface directions. The signs of these anisotropies are opposite at high (~900K) and low (~500K) temperatures, where the MBE growth of stoichiometric (High-Temperature-) and non-stoichiometric (Low-Temperature-) GaAs is usually performed, respectively. As a consequence, these anisotropies cause, at low temperature growth, a rather high As surface concentration (desorption reduced) and, due to the increased in-plane vibrations an enhanced surface diffusion, particularly in the [1,1,0] direction. The anisotropy of the surface diffusion offers a model to explain the experimentally observed dependence of excess As formation during growth on substrate surfaces tilted away from the (001) orientation.
机译:利用半经验的PM3形式主义,通过分子动力学计算研究了富As的GaAs(001)c(4x4)表面重建层中As原子的动力学。如所预期的,与原子相比,表面原子具有增加的振动幅度。此外,在垂直于与平行于表面的振动振幅之间以及在[-1,1,0]与[1,1,0]表面方向之间也存在较大的各向异性。这些各向异性的迹象在高温(〜900K)和低温(〜500K)时是相反的,通常分别进行化学计量(高温)和非化学计量(低温)GaAs的MBE生长。结果,这些各向异性在低温生长时导致相当高的As表面浓度(降低了解吸),并且由于面内振动增加,尤其在[1,1,0]方向上的表面扩散增强。表面扩散的各向异性提供了一个模型,可以解释实验观察到的在远离(001)方向倾斜的衬底表面上生长过程中过量As形成的依赖性。

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