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A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry

机译:一种快速遗传算法,用于使用椭偏仪完全表征透明膜吸收基质系统

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We show that only one measurement of the ellipsometric function p at one angle of incidence and one wavelength is totally sufficient to determine the optical constant of the filmN_1, its thickness d, and the substrate optical constant N_2. Obviously, it's also sufficient to only characterize the film; determine N_1 and d, and to only characterize the substrate; determine N_2 and d. A genetic algorithm (GA) is presented that is based on a physical condition of the film-substrate system. This GA is used to characterize the system in those three separate cases. We show that by removing the film thickness from the fitness function of the GA, the computational effort to characterize the film is reduced from 20 000 to 69 calculations. And that to characterize an absorbing layer is reduced from 80 000 to 180. An error analysis is presented that shows the GA is resilient to random experimental errors.
机译:我们表明,仅在一个入射角和一个波长处对椭圆函数p进行一次测量就完全可以确定薄膜N_1的光学常数,其厚度d和基底光学常数N_2。显然,仅对影片进行特征化就足够了。确定N_1和d,并且仅表征衬底;确定N_2和d。提出了一种遗传算法(GA),该算法基于薄膜-基材系统的物理条件。该GA用于在这三种不同情况下表征系统。我们表明,通过从GA的适应度函数中删除薄膜厚度,表征薄膜的计算量从20000减少到69。表征吸收层的特征从80 000减少到180。进行了误差分析,表明GA可抵抗随机实验误差。

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