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A fast genetic algorithm to fully characterize transparent-film-absorbing-substrate systems using ellipsometry

机译:一种快速遗传算法,用椭偏测量完全表征透明 - 膜吸收衬底系统

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We show that only one measurement of the ellipsometric function ρ at one angle of incidence and one wavelength is totally sufficient to determine the optical constant of the filmN1, its thickness d, and the substrate optical constant N2. Obviously, it's also sufficient to only characterize the film; determine N1 and d, and to only characterize the substrate; determine N2 and d. A genetic algorithm (GA) is presented that is based on a physical condition of the film-substrate system. This GA is used to characterize the system in those three separate cases. We show that by removing the film thickness from the fitness function of the GA, the computational effort to characterize the film is reduced from 20 000 to 69 calculations. And that to characterize an absorbing layer is reduced from 80 000 to 180. An error analysis is presented that shows the GA is resilient to random experimental errors.
机译:我们表明,仅在一个入射角和一个波长处的椭圆形函数ρ的一个测量总是足以确定膜的光学常数,其厚度d和基板光学常数n2。显然,只有只表征电影也足够了;确定N1和D,并仅表征基板;确定n2和d。提出了一种基于薄膜基板系统的物理状况的遗传算法(Ga)。该GA用于在三个单独的情况下表征系统。我们表明,通过从GA的健身功能移除膜厚度,计算薄膜的计算工作量从20 000降至69计算。并且表征吸收层的表征从80 000到180减少。提出了误差分析,其示出了GA对随机实验误差的弹性。

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