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PPPS-2013: Collisional effect on the ion energy distributions outside the sheath during the afterglow of pulsed oxygen and nitrogen plasmas

机译:PPPS-2013:在脉冲氧气和氮气等离子体的余辉期间,对鞘外离子能量分布的碰撞效应

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The time evolution of ion energy distributions (IEDs) during the afterglow was measured in oxygen and nitrogen plasmas generated by an inductively coupled plasma source. The afterglow regimes are prepared by periodically pulsing the plasmas with a period of 1000 µs. The time-resolved retarding field energy analyzer method and Langmuir probe method were used to measure the detailed time evolution of IEDs at 5 µs intervals to investigate precisely what happens during the afterglow regime. The measured results show that in low pressure regime (a few mTorr) two-peak IEDs appear with time, following the IEDs which are generated during the rf-on time. By analyzing the force equation of the ions in a time-varying plasma potential environment, we found that these two-peak structures originate from the delayed arrivals of ions in collisionless discharge volumes. In the case of molecular gas discharges such as oxygen and nitrogen, the two-peak structures seem to last much longer with time than noble gases such as helium, argon and xenon, where electronegativity may affect diffusion time scale during the afterglow. This effect is expected to disappear under high pressure regime where ions lose their energy due to the frictional force caused by collisions between particles, and in this case, the time evolution of IEDs during the afterglow changes its form to a typical single-peak structure. The findings in this experiment can help us understand pulsed plasmas in detail, such as ‘source pulsed’ plasmas which are now widely used in semiconductor etching process.
机译:在由感应耦合等离子体源产生的氧气和氮气等离子体中,测量余辉期间离子能量分布(IED)的时间演变。余辉状态是通过以1000 µs的周期周期性地脉冲等离子体而准备的。使用时间分辨延迟场能量分析仪方法和Langmuir探针法测量IED在5 µs间隔内的详细时间演变,以精确研究余辉过程中发生的情况。测量结果表明,在低压状态(几mTorr)下,随着rf-on时间生成的IED,两个峰值IED随时间出现。通过分析随时间变化的等离子电势环境中离子的力方程,我们发现这些两峰结构源自离子在无碰撞放电体积中的延迟到达。就分子气体放电(例如氧气和氮气)而言,两峰结构的持续时间似乎比稀有气体(例如氦气,氩气和氙气)的时间长得多,在氦气,氩气和氙气中,电负性可能会影响余辉过程中的扩散时间尺度。预期在高压状态下这种效果会消失,在高压状态下离子会由于粒子之间的碰撞而产生的摩擦力而失去能量,在这种情况下,余辉期间IED的时间演变会将其形式改变为典型的单峰结构。该实验中的发现可以帮助我们详细了解脉冲等离子体,例如现在广泛用于半导体蚀刻工艺中的“源脉冲”等离子体。

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