首页> 外文会议>5th International Conference on Diffusion in Materials Pt.1, 5th, Jul 17-21, 2000, Paris France >Hybrid Impurity and Self-Diffusion in GaAs and Related Compounds: Recent Progress
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Hybrid Impurity and Self-Diffusion in GaAs and Related Compounds: Recent Progress

机译:GaAs和相关化合物中的杂化杂质和自扩散:最新进展

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This contribution highlights several outstanding results concerning atomic diffusion in III-V semiconductors. We focus on the technologically important binary compounds that are based on Ga as group-III component. Recent progress in this field of research was obtained from self-atom and hybrid impurity diffusion studies using sophisticated experimental methods. In particular, it is shown for GaAs how the mutual comparison of the resulting two sets of data have provided pertinent information about sublattice-specific diffusion mechanisms and the native point defects involved therein.
机译:这一贡献突出了有关III-V半导体中原子扩散的几个杰出结果。我们重点研究基于Ga作为第三族成分的技术上重要的二元化合物。使用复杂的实验方法,通过自原子和杂化杂质扩散研究获得了该研究领域的最新进展。特别是,对于GaAs,显示了所得的两组数据的相互比较如何提供有关特定于子晶格的扩散机制和其中涉及的自然点缺陷的相关信息。

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