Influence of the excitation frequency increase on a fluid model of the capacitively coupled argon plasma

摘要

A very high frequency plasma enhanced chemical vapor deposition technology (VHF PECVD) is widely used for deposition of amorphous and microcrystalline silicon layers. The satisfying deposition rates and process efficiency combined with adequate material quality make this technology a good solution in the industry applications, especially in the large scale deposition systems.