首页> 外文会议>26th International Symposium for Testing and Failure Analysis, Nov 12-16, 2000, Bellevue, Washington >Yield Enhancement Study: Process Variation and Design Margins Leading to Timing Issues in RAM
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Yield Enhancement Study: Process Variation and Design Margins Leading to Timing Issues in RAM

机译:良率提高研究:导致RAM中时序问题的工艺变化和设计裕度

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This paper illustrates a yield enhancement effort on a Digital Signal Processor (DSP) where random columns in the Static Random Access Memory (SRAM) were found to be failing. In this SRAM circuit, sense amps are designed with a two-stage separation and latch sequence. In the failing devices the bit line and bit_bar line were not separated far enough in voltage before latching got triggered. The design team determined that the sense amp was being turned on too quickly. The final conclusion was that a marginal sense amp design, combined with process deviations, would result in this type of failure. The possible process issues were narrowed to variations of via resistances on the bit and bit_bar lines. Scanning Electron Microscope (SEM) inspection of the the Focused Ion Beam (FIB) cross sections followed by Transmission Electron Microscopy (TEM) showed the presence of contaminants at the bottom of the vias causing resistance variations.
机译:本文说明了在数字信号处理器(DSP)上提高产量的工作,其中发现静态随机存取存储器(SRAM)中的随机列出现故障。在该SRAM电路中,读出放大器被设计为具有两级分离和锁存序列。在发生故障的器件中,在触发闩锁之前,位线和bit_bar线的电压间隔不足。设计团队确定感应放大器的打开速度过快。最终结论是,边际感测放大器的设计加上工艺偏差会导致这种类型的故障。可能的工艺问题被缩小到位和bit_bar线上的通孔电阻变化。扫描电子显微镜(SEM)检查聚焦离子束(FIB)横截面,然后用透射电子显微镜(TEM)检查,发现通孔底部存在污染物,导致电阻变化。

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