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Quantitative Imaging of MOS Interface Trap Distribution by Using Local Deep Level Transient Spectroscopy

机译:MOS阱陷阱分布的局部深层瞬态光谱定量成像

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The local deep level transient spectroscopy, which measures traps with high lateral resolution using sharp tip, was investigated as functions of DC bias. The results showed that the physical origin which was detected by local-DLTS was mainly interface trap. Furthermore, two-dimensional (2D) quantitative profiling of interface traps as a function of time constant was demonstrated. Comparison between images of different time constant revealed that interface traps with different time constant had different lateral distribution, which suggests that 2D distribution of interface traps depends on their energy level. These results show that local-DLTsis promising for microscopic investigation of interface traps.
机译:研究了局部深水平瞬态光谱法,该技术使用尖锐的尖端来测量具有高横向分辨率的阱,并作为直流偏置的函数。结果表明,局部DLTS检测到的物理起源主要是界面陷阱。此外,还证明了界面陷阱的二维(2D)定量分析与时间常数有关。不同时间常数的图像之间的比较表明,具有不同时间常数的界面陷阱具有不同的横向分布,这表明界面陷阱的二维分布取决于它们的能级。这些结果表明,局部DLTsis有望用于界面陷阱的微观研究。

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