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Characterization and gate drive design of high voltage cascode GaN HEMT

机译:高压共源共栅GaN HEMT的表征和栅极驱动设计

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This paper covers characterization and gate drive design for high voltage, gallium nitride (GaN), high electron-mobility transistors (HEMT) in a cascode structure. Parameters of high voltage cascode GaN HEMT devices are described and compared to state-of-the-art Si MOSFET devices. Challenges in designing high frequency GaN based power converter and common design practices are described. Effects of increased switching frequency on gate drive design are analyzed by SPICE modeling and experiments. Optimization of a GaN HEMT driving circuit design is performed and verified experimentally on GaN HEMT half-bridge model.
机译:本文介绍了共源共栅结构中的高压氮化镓(GaN),高电子迁移率晶体管(HEMT)的特性和栅极驱动设计。描述了高压共源共栅GaN HEMT器件的参数,并将其与最新的Si MOSFET器件进行了比较。描述了设计基于高频GaN的功率转换器的挑战和常见的设计实践。通过SPICE建模和实验分析了增加开关频率对栅极驱动器设计的影响。在GaN HEMT半桥模型上执行并实验验证了GaN HEMT驱动电路设计的优化。

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