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Fabrication and characterization of ultrathin fine-pitch flexible polyimide interposer

机译:超薄细间距柔性聚酰亚胺中介层的制备与表征

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摘要

A three-dimensional system-in-package (3-D SiP) based on silicon carriers or an interposer is a fast-emerging technology that offers system design flexibility and the integration of heterogeneous technologies. A passive interposer, which is a way to bridge the feature gap between the integrated circuit (IC) and the package substrate, is a key building block for high performance 3-D systems. The need for high-density interconnection to support 3-D integration has led to a growing demand for the development of fine-pitch and small vias on the interposer. Polyimide base films have been used extensively for flexible and high-density electronic interconnection applications because they offer good thermal and chemical stability with a lower dielectric constant. In this paper, the development of interconnect technology using an ultrathin flexible polyimide interposer (UFPI) for 2.5-D/3-D packaging applications is described in detail. A UFPI with electrodeposited micro-scale copper (Cu) fine patterns (≤50 μm) and laser drilling microvia is investigated using a scanning electron microscope (SEM), energy-dispersive spectrometry (EDS), X-ray spectrometry, and an optical 3-D profilometer. The UFPI can be used to support the very high I/O, high-performance, high-density, and fine-pitch ultrathin chips packages.
机译:基于硅载体或中介层的三维系统级封装(3-D SiP)是一种新兴技术,可为系统设计提供灵活性并集成异构技术。无源中介层是弥合集成电路(IC)与封装基板之间的特征间隙的一种方式,是高性能3-D系统的关键构建块。对于支持3D集成的高密度互连的需求,导致在中介层上开发细间距和小通孔的需求不断增长。聚酰亚胺基膜已被广泛用于柔性和高密度电子互连应用,因为它们具有良好的热稳定性和化学稳定性且介电常数较低。在本文中,将详细介绍使用超薄柔性聚酰亚胺中介层(UFPI)进行2.5-D / 3-D封装应用的互连技术的发展。使用扫描电子显微镜(SEM),能量色散光谱(EDS),X射线光谱和光学3来研究具有电沉积的微型铜(Cu)精细图案(≤50μm)和激光钻孔微孔的UFPI -D轮廓仪。 UFPI可用于支持非常高的I / O,高性能,高密度和细间距的超薄芯片封装。

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