Joining Welding Res. Inst., Osaka Univ., Ibaraki, Japan;
copper; crystallisation; electroless deposited coatings; electroplating; gold; nickel; phase transformations; substrates; surface finishing; thermal stability; Cu; DBC substrate; ENIG plating; air condition; crystallization; direct bond copper; electroless nickel/immersion gold surface finish; nanocrystalline nickel; phase transformation; phosphorus; temperature 250 C; thermal stability; thermal storage test; Aging; Crystallization; Gold; Nickel; Surface finishing; Surface morphology; Thermal stability;
机译:用无电镀镍/浸渍金表面光洁度处理的铜电焊盘的协同电压腐蚀
机译:浸金时间对化学镍/浸金表面处理的电化学迁移性能的影响
机译:温湿处理对化学镀镍金(ENIG)和化学镀镍钯金(ENEPIG)表面处理的环氧树脂Sn-58Bi焊料弯曲可靠性的影响
机译:无电镀镍/浸渍金表面光洁度的热稳定性直接粘接铜
机译:镍金和浸银印刷电路板上的镍增强锡铜焊点的微观组织演变。
机译:薄电解质层下覆铜箔层压板和化学镀镍/浸金印刷电路板的电化学迁移行为
机译:无铅焊料与化学镍/浸金(ENIG)表面涂层之间的界面反应