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Triple-threshold-voltage 9-transistor SRAM cell for data stability and energy-efficiency at ultra-low power supply voltages

机译:三阈值电压9晶体管SRAM单元在超低电源电压下可确保数据稳定性和能效

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摘要

Supply voltage scaling is a commonly used technique for saving energy in microprocessors. The scalability of power supply voltage is limited by the data stability and write ability requirements of SRAM cells in memory cache. Noise margins of memory cells shrink, thereby degrading reliability and causing failure at lower power supply voltages. A triple-threshold-voltage nine-transistor SRAM cell that is capable of reliable operation at ultra-low power supply voltage levels down to 390mV is presented in this paper. While offering comparable or higher data stability, the tri-Vt 9T SRAM array lowers the leakage power consumption, energy per read cycle, and energy per write cycle by up to 94.5%, 22.8%, and 34.5%, respectively, as compared to the conventional 6T SRAM arrays that operate at the nominal VDD = 1.2V in a TSMC 65nm CMOS technology.
机译:电源电压缩放是一种用于节省微处理器能量的常用技术。电源电压的可扩展性受到存储器高速缓存中SRAM单元的数据稳定性和写入能力要求的限制。存储单元的噪声容限减小,从而降低了可靠性并在较低的电源电压下导致故障。本文提出了一种三阈值电压九晶体管SRAM单元,该单元能够在低至390mV的超低电源电压下可靠运行。与提供更高的数据稳定性相比,与之相比,tri-Vt 9T SRAM阵列分别将泄漏功耗,每个读取周期的能量和每个写入周期的能量分别降低了94.5%,22.8%和34.5%。传统的6T SRAM阵列,采用TSMC 65nm CMOS技术以标称VDD = 1.2V工作。

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