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Observation of negative differential conductance in nanoscale p-n junctions

机译:纳米级p-n结中负电导的观察

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Recently p-n junction characteristics in nanometer scale have been investigated in relation with photonics and electronics applications. In this paper, we report the experimental observation of negative differential conductance (NDC), the basic indication of tunneling, in nanoscale p-n junctions under forward bias condition. The NDC has been observed only at low temperatures, suggesting that tunneling is mediated by some states in the band gap, most likely by individual dopants with deeper energy levels compared to bulk. Furthermore, we also observed random telegraph signal (RTS) at low temperatures, which is ascribed to sudden changes of charge states of an individual dopant. These results illustrate the nature of individual dopants in nanoscalep-n junctions and their impact on device characteristics.
机译:最近,已经研究了与光子学和电子学应用有关的纳米级p-n结特性。在本文中,我们报告了在正向偏置条件下在纳米级p-n结中负微分电导(NDC)(隧穿的基本指示)的实验观察。仅在低温下才观察到NDC,这表明隧道效应是由带隙中的某些状态介导的,最有可能是由单个掺杂剂所具有的能级比体能级高。此外,我们还观察到了低温下的随机电报信号(RTS),这归因于单个掺杂剂的电荷状态突然变化。这些结果说明了纳米级p-n结中单个掺杂剂的性质及其对器件特性的影响。

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