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Observation of negative differential conductance in nanoscale p-n junctions

机译:纳米级P-N结的负差分传导观察

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Recently p-n junction characteristics in nanometer scale have been investigated in relation with photonics and electronics applications. In this paper, we report the experimental observation of negative differential conductance (NDC), the basic indication of tunneling, in nanoscale p-n junctions under forward bias condition. The NDC has been observed only at low temperatures, suggesting that tunneling is mediated by some states in the band gap, most likely by individual dopants with deeper energy levels compared to bulk. Furthermore, we also observed random telegraph signal (RTS) at low temperatures, which is ascribed to sudden changes of charge states of an individual dopant. These results illustrate the nature of individual dopants in nanoscalep-n junctions and their impact on device characteristics.
机译:最近,纳米尺度的P-N结特性已经研究了与光子和电子应用相关。 在本文中,我们报告了负差分导电(NDC),隧道的基本指示,在前部偏压条件下的纳米级P-N结的实验观察。 NDC仅在低温下观察到,表明隧道由带隙中的一些州的一些州介导的,并且与批量相比,具有更深的能量水平的个体掺杂剂。 此外,我们还观察到低温下的随机电报信号(RTS),其归因于单个掺杂剂的充电状态的突然变化。 这些结果说明了纳米型电气点连接中的个体掺杂剂的性质及其对器件特性的影响。

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