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Compact modeling and optimization of fine-pitch interconnects for silicon interposers

机译:用于硅中介层的小间距互连的紧凑建模和优化

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This paper presents the first optimization methodology for silicon interposer interconnect technology. The dimensions of these fine-pitch interconnects are roughly a few microns, because of which they can neither be treated as on-chip RC interconnects, nor as conventional off-chip interconnects. 3D extraction tools can provide an accurate estimate of the circuit parameters, but they prove to be very slow and tedious for design space exploration and optimization. Thus, the novel analytical models developed here for the frequency dependent resistance of fine-pitch interconnects are essential to efficiently optimize these interconnects. The error in the model is shown to be less than 15% for interconnect dimensions and frequency range of interest. The analytical models developed are then used to optimize the data-rate and cross-sectional dimensions to maximize the bandwidth-density and minimize the energy-per-bit, simultaneously.
机译:本文介绍了第一个硅中介层互连技术的优化方法。这些细间距互连的尺寸大约为几微米,因此,它们既不能被视为片上RC互连,也不能被视为常规的片外互连。 3D提取工具可以提供电路参数的准确估计,但事实证明,它们对于设计空间的探索和优化非常缓慢且乏味。因此,这里开发的用于细间距互连的频率相关电阻的新颖分析模型对于有效优化这些互连至关重要。对于互连尺寸和感兴趣的频率范围,模型中的误差显示小于15%。然后使用开发的分析模型来优化数据速率和横截面尺寸,以同时最大化带宽密度和最小化每比特能量。

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