首页> 外文会议>IEEE International Conference on Solid-State and Integrated Circuit Technology;ICSICT-2012 >Performance investigation on the reconfigurable Si nanowire schottky barrier transistors
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Performance investigation on the reconfigurable Si nanowire schottky barrier transistors

机译:可重构Si纳米线肖特基势垒晶体管的性能研究

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In this paper, the performance of the reconfigurable Si nanowire schottky barrier transistors (RFETs) is investigated with simulation method. In contrast to conventional Schottky barrier MOSFETs (SB-MOSFETs) and silicon nanowire transistors (Si-NWTs) with metal/silicide as source/drain, the separate two gates in RFETs are located at the two Schottky junctions. Our simulation results show the variable electric characteristics and working principle of the RFETs working as p--type. The RFETs exhibit higher on/off current ratio compared with other Schottky transistors.
机译:本文采用仿真方法研究了可重构Si纳米线肖特基势垒晶体管(RFET)的性能。与传统的以金属/硅化物为源极/漏极的肖特基势垒MOSFET(SB-MOSFET)和硅纳米线晶体管(Si-NWT)相比,RFET中的单独两个栅极位于两个肖特基结处。我们的仿真结果表明,RFET以p- / n型工作时具有可变的电特性和工作原理。与其他肖特基晶体管相比,RFET的导通/截止电流比更高。

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