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Study of reliability in superjunction power VDMOSFET

机译:超结功率VDMOSFET的可靠性研究

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摘要

Comparing with CoolMOSTM, a new deep trench structure of superjunction power VDMOS has been developed in HHNEC. In this paper, we have studied main reliability failure mechanisms subjected to HTRB (High Temperature Reverse Bias). Positive improvement actions from both process and package assembly were showed.
机译:与CoolMOS TM 相比,HHNEC开发了一种新型的超结功率VDMOS深沟槽结构。在本文中,我们研究了承受HTRB(高温反向偏压)的主要可靠性失效机理。结果表明,过程和包装组装都采取了积极的改进措施。

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