首页> 外文会议>2011 International Semiconductor Device Research Symposium >Scaling-up charge injection to nanowire p-n heterojunctions: From individual nanowires to their large size arrays
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Scaling-up charge injection to nanowire p-n heterojunctions: From individual nanowires to their large size arrays

机译:扩大电荷注入到纳米线p-n异质结:从单个纳米线到大尺寸阵列

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One-dimensional nanocrystals and nanowires due to their high crystal quality, ease of growth, control and diversity in their composition have become promising building blocks in a number of technologies including photovoltaic, chemical sensing and light sources. One of the technological barriers to integrate such nanostructures to devices is the inability in controlling their hierarchical order on a scalable fashion. An ordered structure is needed because charge transport must be done at the individual nanowire level. In this presentation, we use a crystal growth technique for wafer scale growth of planar nanowires. We discuss a surface-directed vapor-liquid-solid (SVLS) growth technique in which horizontal nanowires grow from individual Au nanodroplets, and their alignment is dictated by the underlying substrate. SVLS process maintains the strength of the traditional VLS-based methods in growth of nanowires, while enabling excellent control over their hierarchical assemblies. We discuss the concept of “smart surfaces” for planar growth of some semiconductor oxides such as ZnO and TiO2 and present results on growth morphology of other II-VI semiconductors. In this presentation we show the impact of the substrate on growth direction of nanowires and formation of bi- and tri-directional assemblies as well as n-p heterojunctions (Figure 1a, b).
机译:一维纳米晶体和纳米线由于其高质量的晶体质量,易于生长,易于控制和组成上的多样性而成为光伏,化学传感和光源等多种技术中有希望的组成部分。将此类纳米结构集成到设备的技术障碍之一是无法以可扩展的方式控制其层次顺序。需要有序的结构,因为电荷传输必须在各个纳米线级别进行。在此演示文稿中,我们将晶体生长技术用于平面纳米线的晶圆规模生长。我们讨论了一种表面定向的气液固(SVLS)生长技术,其中水平的纳米线从单个的Au纳米液滴中生长出来,并且它们的排列由下面的基底决定。 SVLS工艺在纳米线的生长中保持了传统基于VLS的方法的优势,同时实现了对其分层组件的出色控制。我们讨论了用于某些半导体氧化物(例如ZnO和TiO 2 )的平面生长的“智能表面”的概念,并介绍了其他II-VI半导体的生长形态结果。在此演示文稿中,我们显示了衬底对纳米线生长方向以及双向和三向组件以及n-p异质结形成的影响(图1a,b)。

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