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Effective Dispersion of CMP Slurry Abrasive Particles

机译:CMP浆料磨料颗粒的有效分散

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摘要

Twelve commercially available chemical mechanical planarization (CMP) slurries were analyzed using a liquid dispersion optical analyzer to measure the Settling Rate (SR) from the turbidity data. Required Minimum Flow Velocities (RMFV) in the distribution loop, to keep the abrasive particles dispersed, were obtained from the slurry handling tests in a vacuum-pressure-dispense slurry delivery system and 200 foot long simulated global distribution loop. Comparison of RMFV and SR data reveals an empirical correlation, which can be used to estimate RMFV from SR data in slurries. These results suggest that most silica slurry abrasives can be kept in dispersion (without any significant settling) by maintaining a RMFV value of ~0.5 ft/sec, whereas a majority of alumina and ceria slurries require 1.5 to 2.5 ft/sec, depending on abrasive concentration and background chemistries.
机译:使用液体分散光学分析仪分析了十二种市售化学机械平面化(CMP)浆料,以根据浊度数据测量沉降速率(SR)。通过在真空压力分配浆料输送系统和200英尺长的模拟全局分配环路中进行的浆料处理测试,获得了分配环路中所需的最小流速(RMFV),以保持磨料颗粒分散。 RMFV和SR数据的比较揭示了一种经验相关性,可用于从浆料中的SR数据估算RMFV。这些结果表明,通过将RMFV值保持在〜0.5 ft / sec,可以将大多数二氧化硅浆料研磨剂保持分散状态(没有任何明显的沉降),而大多数氧化铝和二氧化铈浆料需要1.5至2.5 ft / sec,具体取决于研磨剂浓度和背景化学。

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