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Fabrication of Au/PZT/BIT/Si heterostructure by pulsed-laser deposition

机译:脉冲激光沉积法制备Au / PZT / BIT / Si异质结构

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Abstract: The MFS heterostructures with structure of Au/PZT/p-Si and Au/PZT/BIT/p-Si were fabricated using pulsed laser deposition technique. The PZT ferroelectric thin films were deposited directly on Si or with a BIT buffer layer. P-E hysteresis loop, capacitance-voltage characteristics and current-voltage characteristics of the heterostructures were measured respectively. The results are performed and discussed.!8
机译:摘要:利用脉冲激光沉积技术制备了具有Au / PZT / p-Si和Au / PZT / BIT / p-Si结构的MFS异质结构。将PZT铁电薄膜直接沉积在Si上或使用BIT缓冲层沉积。分别测量了异质结的P-E磁滞回线,电容-电压特性和电流-电压特性。结果被执行和讨论。!8

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