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PHOTOSENSITIVE POLYIMIDE FOR MCM-D/L

机译:用于MCM-D / L的光敏聚酰亚胺

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摘要

The use of thin film redistribution on a laminate substrate, MCM-D/L, offers a favorable cost/performance ratio for many applications including portable electronics. No commercial thin film dielectric materials have been developed specifically for this application. Epoxy-based soldermasks have been employed but these materials tend to suffer from thickness, resolution, and adhesion limitations. Compatibility with conventional laminate fabrication processes requires good adhesion to plated copper, a low cure temperature, and low shrinkage. Polyimides, while widely used in MCM-D constructions, are generally not suitable for this application because of the cure temperature and thickness requirements. Moreover, most polyimide coatings are not compatible with copper. One class of polyimide coatings, however, is well suited to MCM-D/L. Auto-photosensitive, preimidized polyimide solutions do not require a conventional cure and are easily processed in thick coats with a resolution of up to 1:1. Adhesion to copper has been measured at over 6 lb/in. This paper discusses the use of this type of polyimide coating for thin film redistribution on FR-4 and similar low temperature substrates.
机译:在层压基板上使用薄膜再分布MCM-D / L,可为包括便携式电子设备在内的许多应用提供良好的性价比。还没有专门为此应用开发商业薄膜介电材料。已经使用了基于环氧树脂的阻焊剂,但是这些材料往往会受到厚度,分辨率和附着力的限制。与常规层压板制造工艺的兼容性要求对镀铜具有良好的附着力,较低的固化温度和较低的收缩率。聚酰亚胺虽然广泛用于MCM-D结构,但由于固化温度和厚度要求,通常不适合该应用。而且,大多数聚酰亚胺涂层与铜不相容。但是,一类聚酰亚胺涂料非常适合MCM-D / L。自动光敏,预酰亚胺化的聚酰亚胺溶液不需要常规固化,并且可以容易地加工成分辨率高达1:1的厚涂层。经测量,铜的附着力超过6磅/英寸。本文讨论了这种类型的聚酰亚胺涂层在FR-4和类似的低温基材上进行薄膜再分布的用途。

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