A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261,

Seino H.; Haba O.; Ueda M.; Mochizuki A.

首页> 外文期刊>Journal of Polymer Science, Part A. Polymer Chemistry >A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261,

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A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261,

机译：一种正型光敏碱性可显影的聚酰亚胺，具有高度的尺寸稳定性和低介电常数，基于聚（酰胺酸）作为聚酰亚胺前体，而重氮萘醌作为光敏化合物（第36卷，第2261页，

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《Journal of Polymer Science, Part A. Polymer Chemistry》 |1998年第17期|共1页
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Seino H.; Haba O.; Ueda M.; Mochizuki A.;
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中图分类高分子化合物工业（高聚物工业）;高分子化学（高聚物）;
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入库时间 2022-08-19 03:52:24

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1. A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261, [J] . Seino H., Haba O., Ueda M., Journal of Polymer Science, Part A. Polymer Chemistry . 1998,第17期

机译：一种正型光敏碱性可显影的聚酰亚胺，具有高度的尺寸稳定性和低介电常数，基于聚（酰胺酸）作为聚酰亚胺前体，而重氮萘醌作为光敏化合物（第36卷，第2261页，
2. A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound [J] . Seino H., Haba O., Ueda M., Journal of Polymer Science, Part A. Polymer Chemistry . 1998,第13期

机译：基于聚酰胺酸作为聚酰亚胺前体和重氮萘醌作为光敏化合物的具有高尺寸稳定性和低介电常数的正型光敏碱性可显影聚酰亚胺
3. Photosensitive polyimide-precursor based on poly(amic acid): dimensionally stable polyimide with a low dielectric constant [J] . Hiroshi Seino, Amane Mochizuki, Osamu Haba, Polymer Preprints . 1998,第2期

机译：基于聚酰胺酸的光敏聚酰亚胺前体：尺寸稳定的聚酰亚胺，介电常数低
4. Photosensitive Polyimide Based on Poly(amic acid) and Thermal Imidization at 200℃ with Photo-Base Generator [C] . Ken-ichi Fukukawa, Yuji Shibasaki, Mitsuru Ueda International Conference on Radiation Curing(RadTech Asia 2005); 20050523-26; Shanghai(CN) . 2005

机译：基于聚酰胺酸的光敏聚酰亚胺和光碱发生器在200℃热亚胺化
5. 1H NMR and FT-IR dataset based structural investigation of poly(amic acid)s and polyimides from 44′-diaminostilbene [O] . Amit Kumar, Seiji Tateyama, Katsuaki Yasaki, 2016

机译：基于1H NMR和FT-IR数据集的44-二氨基二苯乙烯聚（酰胺酸）和聚酰亚胺结构研究
6. New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, [O] . A Cross-linker, A Photoacid Generator, Yasufumi Watanabe, 2004

机译：新型负型光敏碱性显影半芳族聚酰亚胺，具有低介电常数，基于含有金刚烷基和芳香族二酐的芳族二胺的聚（酰胺酸），
7. Process for lowering the dielectric constant of polyimides using diamic acid additives [R] . 1990

机译：使用二甲酸添加剂降低聚酰亚胺的介电常数的方法

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound (vol 36, pg 2261,

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