首页> 外文会议>15th International Plansee Seminar 2001 2001 null >LOW-PRESSURE c-BN DEPOSITION ― IS A CVD PROCESS POSSIBLE ?
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LOW-PRESSURE c-BN DEPOSITION ― IS A CVD PROCESS POSSIBLE ?

机译:低压c-BN沉积-是否可以进行CVD工艺?

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Since the low-pressure diamond deposition was discovered in 1982 there is a high interest to find a similar process for the c-BN synthesis. During the last years many researchers propagated success, but many of them failed in analytical problems characterizing the BN coatings. A new paper by S. Matsumoto and W. Zhang shows c-BN deposition using a DC Plasma Jet and characterization by various analytical methods. Our experiments were carried out with a simple CVD reactor with out plasma activation. Various BN layers were deposited and characterized. X-ray diffraction, IR-spectroscopy and SIMS indicate that BN-coatings containing c-BN were deposited. However a final verification of c-BN crystallites by TEM investigations was not possible till now.
机译:自1982年发现低压金刚石沉积以来,人们非常希望找到一种类似的c-BN合成方法。在过去的几年中,许多研究人员传播了成功,但许多人未能解决表征BN涂层的分析问题。 S. Matsumoto和W. Zhang的新论文显示了使用DC等离子射流进行c-BN沉积并通过各种分析方法进行表征。我们的实验是在没有等离子体活化的简单CVD反应器中进行的。沉积并表征了各种BN层。 X射线衍射,IR光谱和SIMS表明沉积了含有c-BN的BN涂层。然而,到目前为止,尚不可能通过TEM研究对c-BN晶体进行最终验证。

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