SILICON STRUCTURES MICROMACHINED IN TMAH AND NAOH SOLUTIONS : CHARACTERIZATION OF THE ANISOTROPY AND COMPUTER AIDED DESIGN OF STRUCTURES

摘要

TMAH and NaOH etchants are used to micromachine beams on various (hhl) silicon planes. An experimental and comparative study of the changes in the shape and in the width of beams with the cut and with the direction of alignment is undertaken. In addition for TMAH theoretical shapes are derived from the' CAO tool TENSOSIM and the effect of misalignment is theoretically investigated.