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CLEANING PROCESS CONSIDERATIONS FOR ADVANCED PACKAGING DEVICES AND ASSEMBLY

机译:高级包装设备和组件的清洁过程注意事项

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摘要

There has been significant evolution of both cleaning requirements and solutions over the past few years. As Flip Chip I/O counts continue to increase, reliability concerns have renewed design engineers interest to study the benefits of removing flux residue. The purpose of this paper reports advanced cleaning process research to open the process window when cleaning flux residues from beneath low stand off devices. The paper will focus on advanced cleaning fluid and mechanical impingement design factors that open the process window. Data will be presented from comprehensive, ongoing studies designed to evaluate the match between soldering and cleaning technologies across a broad range of process technology equipment options.
机译:在过去的几年中,清洁要求和解决方案都有了很大的发展。随着倒装芯片I / O数量的不断增加,可靠性问题引起了设计工程师对研究去除焊剂残渣益处的兴趣。本文的目的是报告先进的清洁工艺研究,以在清洁低支架装置下方的助焊剂残留时打开工艺窗口。本文将重点介绍可打开工艺窗口的高级清洗液和机械冲击设计因素。将从正在进行的全面研究中提供数据,这些研究旨在评估各种工艺技术设备选件中焊接和清洁技术之间的匹配性。

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