首页> 外国专利> DISLOCATION TYPE AND DENSITY DISCRIMINATION IN SEMICONDUCTOR MATERIALS USING CATHODOLUMINESCENCE MEASUREMENTS

DISLOCATION TYPE AND DENSITY DISCRIMINATION IN SEMICONDUCTOR MATERIALS USING CATHODOLUMINESCENCE MEASUREMENTS

机译:利用阴极发光测量半导体材料中的位错类型和密度判别

摘要

A cathodoluminescence microscope and method are used to identify and classify dislocations within a semiconductor sample. At least two CL polarized images are concurrently obtained from the sample. The images are added together to obtain a total intensity image. A normalized difference of the images is taken to obtain a degree of polarization (DOP) image. The total intensity and DOP images are compared to differentiate between edge dislocations and screw dislocations within the sample. Edge dislocation density and screw dislocation density may then be calculated.
机译:阴极发光显微镜和方法用于识别和分类半导体样品中的位错。从样品中同时获得至少两个CL偏振图像。将这些图像相加以获得总强度图像。对图像进行归一化差分,以获得偏振度(DOP)图像。比较总强度和DOP图像,以区分样品中的边缘位错和螺旋位错。然后可以计算边缘位错密度和螺旋位错密度。

著录项

  • 公开/公告号WO2022118294A1

    专利类型

  • 公开/公告日2022-06-09

    原文格式PDF

  • 申请/专利权人 ATTOLIGHT AG;

    申请/专利号WO2021IB61339

  • 发明设计人 FOUCHIER MARC;MONACHON CHRISTIAN;

    申请日2021-12-04

  • 分类号H01J37/22;

  • 国家 IB

  • 入库时间 2024-06-14 23:13:43

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