PRODUCTION OF A COLLECTOR FOR MICROELECTRONIC DEVICE

摘要

The present invention relates to a method for producing a microelectronic device comprising successively: a formation of a first current collector on a face of a substrate; - forming a first electrode (14) on and in electrical continuity with a portion of the first current collector; a heat treatment configured to process the first electrode (14) characterized by the fact that: the formation of the first collector comprises forming a first collector layer (12) on the face of the substrate and forming a second collector layer (13) covering at least a portion, referred to as the coated portion, of the first layer (12) of collector and having a first face in contact with the first electrode (14), the second collector layer (13) is configured to protect the coated portion during the heat treatment, so that the heat treatment does not oxidize said coated portion.