Plasma probe device and plasma processing device

摘要

To provide a plasma probe apparatus that avoids the entry of gas.SOLUTION: A plasma probe apparatus includes an antenna unit attached to an opening formed in a wall or a mounting table of a processing container via a seal member for sealing between a vacuum space and an atmosphere space, an electrode connected to the antenna unit, and a dielectric support portion formed of a dielectric body and supporting the antenna portion from the periphery. Facing surfaces of the antenna unit and the wall or the mounting table are separated at a predetermined width, and the surface of the antenna unit exposed from the opening is recessed relative to the wall in which the opening is formed or the surface on the plasma generation space side of the mounting table.SELECTED DRAWING: Figure 3