首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Large Scale Arrays of Microeavsty Plasma Devices Based on Encapsulated Al/Al{sub}2O{sub}3 Electrodes: Device Characteristics as a Plasma Display Pixel and Low Cost Wet Chemical Fabrication Processing
【24h】

Large Scale Arrays of Microeavsty Plasma Devices Based on Encapsulated Al/Al{sub}2O{sub}3 Electrodes: Device Characteristics as a Plasma Display Pixel and Low Cost Wet Chemical Fabrication Processing

机译:基于封装的Al / Al {sub} 2O {sub} 3电极的微细等离子设备的大规模阵列:作为等离子显示像素和低成本湿法化学加工工艺的设备特性

获取原文
获取原文并翻译 | 示例
           

摘要

Addressable, large scale arrays of microcavity plasma devices have been fabricated by wet chemical processes. Dielectric encapsulated aluminum microcavity electrodes having cavities with a diameter of 100-200 μm are formed by wet electrochemical process suitable for low cost manufacturing. This presentation reports device structure and cell designs for high pressure Xe microplasmas.
机译:已经通过湿化学工艺制造了可寻址的大规模微腔等离子体装置阵列。通过适合于低成本制造的湿式电化学工艺形成具有直径为100-200μm的腔的电介质封装的铝微腔电极。本演讲报告了高压Xe血浆的设备结构和细胞设计。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号