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DISPATCHING METHOD FOR SEMICONDUCTOR PROCESS PRODUCTION LINE, STORAGE MEDIUM AND SEMICONDUCTOR DEVICE

机译:半导体工艺生产线的调度方法,存储介质和半导体器件

摘要

The present application relates to a dispatching method for a semiconductor process production line, a storage medium and a semiconductor device. The dispatching method for a semiconductor process production line can acquire an overlay error reference curve of a product lot to be exposed on a machine, and set an overlay error range according to the overlay error reference curve. After the exposure is completed, an overlay error of said product lot can be acquired, and a determination can be made as to whether the overlay error falls within the overlay error range. If the overlay error of said product lot does not fall within the overlay error range, the machine can be used to continue processing said product lot. If the overlay error of said product lot falls within the overlay error range, it indicates that the difference between the exposure energies of two adjacent product lots processed by the machine is relatively large, and it is necessary to perform pre-cooling processing on the machine, so that the overlay error is within an acceptable range, and the yield of semiconductor products is ensured.
机译:本申请涉及半导体处理生产线,存储介质和半导体器件的调度方法。半导体过程生产线的调度方法可以在机器上获得产品批次的覆盖误差参考曲线,并根据覆盖误差参考曲线设置覆盖误差范围。在曝光完成之后,可以获得所述产品批次的覆盖误差,并且可以确定覆盖误差是否落在覆盖误差范围内。如果所述产品批叠的覆盖错误不会落在覆盖误差范围内,则可用于继续处理所述产品批次。如果所述产品批次的覆盖误差落在覆盖误差范围内,则表示机器处理的两个相邻产品批次的曝光能量之间的差异相对较大,并且有必要对机器进行预冷却处理,使得覆盖误差在可接受的范围内,并且确保了半导体产品的产量。

著录项

  • 公开/公告号WO2021254111A1

    专利类型

  • 公开/公告日2021-12-23

    原文格式PDF

  • 申请/专利权人 CHANGXIN MEMORY TECHNOLOGIES INC.;

    申请/专利号WO2021CN95901

  • 发明设计人 HUANG CHIN-CHANG;

    申请日2021-05-26

  • 分类号G03F7/20;H01L21/67;

  • 国家 CN

  • 入库时间 2022-08-24 23:02:08

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