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Infrared Applications of Semiconductors - Materials, Processing and Devices. Symposium Held December 2-5, 1996, Boston, Massachusetts, U.S.A. Volume 450

机译:半导体的红外应用 - 材料,加工和器件。研讨会于1996年12月2日至5日在美国马萨诸塞州波士顿举行,第450卷

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The symposium entitled 'Infrared Applications of Semiconductors- Materials, Processing and Devices' was held on December 2-6, 1996, in Boston, Massachusetts, as Symposium 0 of the 1996 MRS Meeting, and was a joint session with the 1996 International Conference on Electronic Materials. The symposium focused on recent investigations based on III-V, II- VI, and IV bulk semiconductors, quantum wells, and superlattices for infrared detectors, emitters, sources, and materials. Internationally-known experts in the subject presented 86 oral papers covering this diverse field. The resulting 68 papers published in this proceedings are a representative snapshot of the fast-changing field of novel structures and processes that can be used to achieve high- performance Infrared detectors, imaging arrays, infrared lasers and sources.

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