Step substrate coating composition comprising a compound having a photo-crosslinking group due to unsaturated bonds between carbon atoms

摘要

[Problem] To provide a coating composition for a stepped substrate for forming a film having pattern filling properties and planarization properties. [Solutions] A compound (E) containing a partial structure (I) and a partial structure (II) and a solvent (F) are included, and this partial structure (II) is formed by reaction of an epoxy group with a proton generating compound. A photocurable stepped substrate coating composition containing a hydroxy group, wherein the partial structure (I) is at least one partial structure selected from the group consisting of the following formulas (1-1) to (1-5), or formula (1- 6) and a partial structure consisting of a combination of Formula (1-7) or Formula (1-8), wherein the partial structure (II) is a partial structure of Formula (2-1) or Formula (2-2) . Further, in the compound (E), an epoxy group and a hydroxyl group are included in a molar ratio such that 0≤(epoxy group)/(hydroxy group)≤0.5, and partial structure (II) is 0.01≤(partial structure (II))/( The composition comprising a molar ratio such that partial structure (I) + partial structure (II)) ≤ 0.8.