首页> 外国专利> STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS

机译:阶梯状底物涂料成分,包括由于碳原子之间的不饱和键而具有光交联基团的化合物

摘要

A stepped substrate coating composition includes: a compound (E) containing partial structures (I) and (II) and a solvent (F). The partial structure (II) contains a hydroxy group generated by an epoxy group and a proton-generating compound reaction; the partial structure (I) is at least one partial structure selected from partial structures of Formula (1-1) to Formula (1-5) or a partial structure combining a partial structure of Formula (1-6) and Formula (1-7) or Formula (1-8); and the partial structure (II) is a partial structure of Formula (2-1) or Formula (2-2). The photocurable stepped substrate coating composition wherein in the compound (E), the epoxy group and the hydroxy group are contained in a molar ratio of 0≤(Epoxy group)/(Hydroxy group)≤0.5 and the partial structure (II) is contained in a molar ratio of 0.01≤(Partial structure (II))/(Partial structure (I)+Partial structure (II))≤0.8.
机译:一种阶梯式基材涂料组合物,包括:包含部分结构(I)和(II)的化合物(E)和溶剂(F)。部分结构(II)包含由环氧基和质子生成化合物反应生成的羟基。所述部分结构(I)是选自式(1-1)至式(1-5)的部分结构或组合式(1-6)和式(1-的部分结构)的部分结构中的至少一种部分结构。 7)或公式(1-8);部分结构(II)是式(2-1)或式(2-2)的部分结构。在化合物(E)中,环氧基和羟基的摩尔比为0≤(环氧)/(羟基)≤0.5,并且含有部分结构(II)的光固化性台阶基材涂料组合物摩尔比为0.01≤(部分结构(II))/(部分结构(I)+部分结构(II))≤0.8。

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