IMPACT OF SCANNER-AXIAL-CHROMATIC ABERATION ON AERIAL IMAGE

摘要

An inspection apparatus (4) of a mask (8) for semiconductor lithography, comprising: an imaging apparatus (9) for imaging the mask (8); at least one calibration body (21 , 21 ′, 21 ″) exhibiting dispersion behavior for at least one sub-range of the illuminating radiation (6) used for imaging, the mask (8) comprising an image recording device (10) ) and an inspection device arranged in the optical path between the image recording device 10. A method for taking into account longitudinal chromatic aberration in the inspection device 4 for a mask 8, wherein different A method comprising the steps of: recording a specified number of images having focus positions (F1, F2, F3, F4, F5), selecting a subset of said images and simulating longitudinal chromatic aberration of a projection exposure apparatus.